TOKYO, Mar 10 (Pulse News Wire) – JX Advanced Metals Corporation (5016.T) announced plans to enhance its production capacity for semiconductor sputtering targets at its Hitachinaka New Plant in Ibaraki Prefecture. The investment, expected to cost approximately ¥23.00 billion, aims to meet growing demand driven by advancements in AI data centers and high-bandwidth memory (HBM) technologies.
In July 2025, the company began trial operations for part of the production equipment for semiconductor sputtering targets, planning to fully open the facility by the end of March 2026. The expansion follows a previous announcement on March 6, 2024, which detailed changes to the initial investment plan for the Hitachinaka plant. This latest investment includes the previously disclosed amount of ¥6.600 billion mentioned in a press release dated July 18, 2025.
The enhanced production capacity is projected to increase by 1.6 times compared to fiscal 2023, with phased startup scheduled to begin in the latter half of fiscal 2027. The move underscores JX Metal's commitment to strengthening its presence in the global advanced semiconductor supply chain while leveraging expertise developed at its existing Isahara Plant. This capital expenditure is anticipated to have a minor impact on the consolidated performance for the fiscal year ending March 2026.
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